BICMOS Technology

  BiCMOS Logic: Bicmos technology is a complex processing technology that gives NMOS and PMOS advances amalgamated each other with the upsides of having extremely low power utilization bipolar innovation and high speed over CMOS innovation. MOSFETs give high input impedance logic gates  and bipolar semiconductors give high current increase. Steps for BiCMOS Fabrication:  BiCMOS manufacture process  is similar of creation of BJT and CMOS, but only variety is an acknowledgment of the base. The following steps shows the BiCMOS manufacture process Step1:   P-Substrate is taken as shown in the below figure P-substrate Step2:   P-substrate is covered with the oxide layer P-substrate with oxide layer Step3:  A little opening is made on the oxide layer Opening is made on the oxide layer Step4:  N-type impurities are heavily doped through that opening N-type impurities are intensly doped through the opening Step5:  The P – Epitaxy layer is grown on the whole surface Epitaxy layer is grown on th